Our coating platform typically combines organic and inorganic layers deposited at ambient temperature via an enhanced proprietary Chemical Vapor Deposition (CVD) process.
Our single-chamber CVD reactor allows 3D conformal deposition of Parylene, ceramic or combined Parylene/ceramic multilayers on a variety of substrates and complex geometries.
The proprietary design of our third generation of reactors offers a tight control of the coating’s thickness as well as full flexibility of the layer combinations.