Parylene Chemical Vapor Deposition (CVD)
Parylene Deposition: Understanding the Gorham Process Parylene is a polymer that cannot be applied by brush, dipping, or spraying. It forms directly on the part to be protected, molecule by molecule, from a vapor. Parylene chemical vapor deposition, developed by William Gorham in the 1960s, takes place under vacuum and consists of three successive steps, […]
Plasma Enhanced Chemical Vapor Deposition (PECVD)
PECVD Principle Depositing SiO₂ by conventional CVD takes substrate temperatures of several hundred degrees, which rules out electronics, solder joints and polymers. PECVD replaces thermal energy with electrical energy. A radio-frequency field at 13.56 MHz sustains a plasma in the reactor, a partially ionized gas containing free electrons, ions and radicals. The electrons, being light, […]
Atomic Layer Deposition Process (ALD)
ALD Principle CVD and PECVD (both available in our CX-30, CX-300 and CX-600. deposition systems) are continuous processes: precursor flows in, the film grows, and thickness is set by deposition time. The atomic layer deposition process or ALD, developed by Tuomo Suntola in the 1970s, splits the growth into two half-reactions that never happen at […]
Parylene Chemistry, Grades and Properties
A Polymer to Protect the Electronics Parylene is a widely used material that is mostly applied on critical electronic circuit to provide a strong protection in harsh environment. Especially for the medical device, aerospace and space industry, parylene is the material of choice. Parylene is a polymer with unique properties and deposition process. The vapor […]